| AVS 46th International Symposium | |
| Electronic Materials and Processing Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | EM-TuM1 Structural Transition Layers at the Interface of SiO@sub 2@/Si(100) Fabricated by Ozone K. Nakamura, H. Itoh, A. Kurokawa, S. Ichimura, Electrotechnical Laboratory, Japan, K. Koike, G. Inoue, T. Fukuda, Iwatani International Corporation, Japan |
| 8:40am | EM-TuM2 Invited Paper Infrared Spectroscopy as a Probe of Semiconductor/Dielectric Interfaces: Growth and Structure of SiO@sub 2@ on Si K.T. Queeney, M.K. Weldon, Y.J. Chabal, K. Raghavachari, Bell Laboratories, Lucent Technologies |
| 9:20am | EM-TuM4 Real Time Observation on Si(001) Surface Oxidation by Scanning Tunneling Microscopy K. Miki, Electrotechnical Laboratory, Japan, Y. Kudo, M. Murata, K. Yamabe, Tsukuba University, Japan |
| 9:40am | EM-TuM5 Scanning Tunneling Microscopy Study of Surface Morphology of Si(111) after Synchrotron Radiation Stimulated Desorption of SiO@sub 2@ Y. Gao, T. Miyamae, H. Mekaru, T. Urisu, Institute for Molecular Science, Japan |
| 10:00am | EM-TuM6 How Important are Second Nearest Neighbor Effects in Silicon 2p Photoemission Spectroscopy of Si/SiO@sub 2@ Interfaces? J. Eng, Jr., K. Raghavachari, Bell Labs, Lucent Technologies |
| 10:20am | EM-TuM7 FTIR Studies of the Nitridation of Si(100)-(2x1) and Oxidized Silicon K.T. Queeney, Y.J. Chabal, J. Eng, Jr., K. Raghavachari, Bell Laboratories, Lucent Technologies, X. Zhang, E. Garfunkel, Rutgers University, S.B. Christman, E.E. Chaban, Bell Laboratories, Lucent Technologies |
| 10:40am | EM-TuM8 Invited Paper Silicon Passivation Chemistry for MEMS Technology R. Maboudian, University of California, Berkeley |
| 11:20am | EM-TuM10 STM Studies of the Site-specific Reactivity of Isopropanol in Aqueous Silicon Etching: Controlling Morphology with Surface Chemistry M.A. Hines, T.A. Newton, Y.-C. Huang, L.A. Lepak, Cornell University |
| 11:40am | EM-TuM11 Removal of Native Oxide Employing Heated NH@sub 3@/NF@sub 3@ Mixture H. Ogawa, The University of Tokyo, Japan, T. Arai, T. Ichiki, Toyo University, Japan, Y. Takamura, Y. Horiike, The University of Tokyo, Japan |