AVS 46th International Symposium | |
Applied Surface Science Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | AS-WeM1 Monte Carlo Simulations for Tilted Electron Multipliers@footnote 1@ Y.S. Choi, S.G. Yu, J.M. Kim, Samsung Advanced Institute of Technology, Korea |
8:40am | AS-WeM2 Invited Paper Gaede-Langmuir Award Address: Early Development of Auger and ESCA Instrumention P.W. Palmberg, Physical Electronics |
9:40am | AS-WeM5 Consistent, Combined Quantitative AES and XPS Digital Data Bases - Convergence of Theory and Experiment M.P. Seah, I.S. Gilmore, S.J. Spencer, National Physical Laboratory, United Kingdom |
10:00am | AS-WeM6 Relationships between Parameters Describing Inelastic Electron Scattering in Solids A. Jablonski, Polish Academy of Sciences, C.J. Powell, National Institute of Standards and Technology |
10:20am | AS-WeM7 Straightforward Methods for Accurate Estimation of Attenuation Length and Similar Quantities in XPS and AES P.J. Cumpson, M.P. Seah, I.S. Gilmore, National Physical Laboratory, UK |
10:40am | AS-WeM8 Quantitative Auger Spectroscopy: Applications to Process Development and Qualification of Tungsten Silicide Films C.T. Dziobkowski, S.C. Ramac, IBM Corp., E. Fishkill, E.D. Adams, IBM Corp., Burlington |
11:00am | AS-WeM9 Naphthalocyanine Molecules onto Si(111)7x7 and Si(100)2x1: Modes of Adsorption and Effects of Oxygen Doping Investigated with XPS L. Ottaviano, INFM, Italy, L. Lozzi, A. Montefusco, S. Santucci, University of L'Aquila and INFM, Italy |
11:20am | AS-WeM10 Technique for Production of Calibrated Metal Hydride Films R.A. Langley, J.F. Browning, S.D. Balsley, J.C. Banks, B.L. Doyle, W.R. Wampler, Sandia National Laboratories |
11:40am | AS-WeM11 The Role of SIMS for Interface Control in the MBE Growth of InGaSb/InAS Strained Layer Superlattices J.S. Solomon, M.L. Seaford, D.H. Tomich, K.G. Eyink, Air Force Research Laboratory |