AVS 46th International Symposium
    Vacuum Technology Division Friday Sessions
       Session VT-FrM

Paper VT-FrM8
Increased Utilization of Semiconductor Process Equipment through Comprehensive Downstream By-product Management

Friday, October 29, 1999, 10:40 am, Room 610

Session: Vacuum Systems, Design, and Engineering
Presenter: T.E. Nilsson, Nor-Cal Products, Inc.
Correspondent: Click to Email

Fab maintenance personnel and equipment manufacturers share the common goal of extending preventative maintenance intervals and reducing wafer defects in process equipment in order to increase return on investment. Condensable by-product accumulation in forelines, dry pumps and exhaust lines is a significant contributor to wafer defects and planned and unplanned maintenance. Vacuum components, such as heater jackets and foreline traps, can extend preventative maintenance intervals dramatically when applied properly to a specific process. A Comprehensive Downstream Solution is one that first takes into account the specific process chemistries, temperatures and pressures, as well as any equipment constraints. The array of vacuum components and special treatments are passed through two filters: component configuration and a cost of ownership model. Component configuration considers the effect on the performance of the components by changing their relative position in the system. A cost of ownership model is developed with the customer for each option proposed showing the cost of the improvement and the pay back in terms of savings on maintenance and increased production.