AVS 46th International Symposium
    Thin Films Division Thursday Sessions
       Session TF-ThM

Paper TF-ThM6
Simulation of Fundamental Physical Phenomena in the Deposition of Nanophase Thin Films using a Sputtering Based Source

Thursday, October 28, 1999, 10:00 am, Room 615

Session: Nanophase Thin Films
Presenter: A. Hosseini-Tehrani, Florida International University
Authors: F.K. Urban III, Florida International University
A. Hosseini-Tehrani, Florida International University
A. Khabari, Florida International University
P. Griffiths, Florida International University
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Recently, nanophase thin films have been deposited by sputtering target material into a chamber designed and operated to promote condensation of the sputtered species into nanoparticles. Interesting optical and magnetic properties has been reported for these films. It has been recognized that quantum size effects are most consistent with observed data. The structure of the film and the grain size determines the film properties. In this work, the classical nucleation theory has been used to understand the processes involved in the nucleation and condensation of the particles. A detailed analysis of the nanoparticle beam energy has been carried out by deflecting, accelerating the beam and comparing the experimental data with simulations by SIMION computer code. Results of simulations and comparison to measuremnts and to the resulting depositd films will be presented.