AVS 46th International Symposium
    Thin Films Division Thursday Sessions
       Session TF-ThM

Paper TF-ThM5
Interesting Properties of Nanophase Films Deposited from a High-rate, Nanoparticle Beam

Thursday, October 28, 1999, 9:40 am, Room 615

Session: Nanophase Thin Films
Presenter: F.K. Urban III, Florida International University
Authors: F.K. Urban III, Florida International University
A. Khabari, Florida International University
A. Hosseini-Tehrani, Florida International University
P. Griffiths, Florida International University
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Nanophase thin films have been deposited by sputtering target material into a chamber designed and operated to promote condensation of the sputtered species into nanoparticles. Flowing argon and helium gas are used to sputter and assist condensation. Particle size and numbers depend on the nucleation rate, condensation rate, and time available for these processes. Films have been deposited from copper, cobalt, molybdenum, and composite copper-cobalt targets. The work to be reported here explores soft-landed nanoparticle films using no acceleration. The soft landed films are porous with nanocrystalline structure from about 5 to 10 nm crystallites. Properties of films are different from bulk and film literature values. The change in film structure with acceleration will be reported. SEM, TEM, AES, RBS, and AFM results will be presented.