AVS 46th International Symposium
    Thin Films Division Monday Sessions
       Session TF+VM-MoM

Paper TF+VM-MoM9
Plasma Assisted Physical Vapour Deposition of BN by DC Pulsed Sputtering of a B@sub 4@C Target

Monday, October 25, 1999, 11:00 am, Room 620

Session: Advances in Hard and Superhard Coatings I
Presenter: L.A. Gea, European Commission Joint Research Centre, Italy
Authors: L.A. Gea, European Commission Joint Research Centre, Italy
G. Ceccone, European Commission Joint Research Centre, Italy
F. Rossi, European Commission Joint Research Centre, Italy
Correspondent: Click to Email
Boron nitride coatings were deposited on Si (100) polished crystals by DC pulsed magnetron sputtering of a B4C target with auxiliary microwave Distributed Electron Cyclotron Resonance (DECR) plasma.The substrates were biased by an independent R.F. source. Characterization of the plasma was undertaken as a function of the total pressure, the nitrogen gas content and the microwave power. The presence of the various species was identified with Optical Emission Spectroscopy.Mass Spectrometry was used to determine the ion energy distribution while the plasma potential and the plasma densities were measured with a single Langmuir probe.The coatings have been characterized by Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES), and Fourier Transformed Infrared Spectrometry ( FTIR)