AVS 46th International Symposium
    Thin Films Division Monday Sessions
       Session TF+VM-MoM

Paper TF+VM-MoM8
Mechanical Properties of Cubic Boron Nitride Thin Films Synthesized by ECR PECVD: Influence of Deposition Conditions

Monday, October 25, 1999, 10:40 am, Room 620

Session: Advances in Hard and Superhard Coatings I
Presenter: M.P. Delplancke-Ogletree, Université Libre de Bruxelles, Belgium
Authors: M.P. Delplancke-Ogletree, Université Libre de Bruxelles, Belgium
M. Ye, Université Libre de Bruxelles, Belgium
Correspondent: Click to Email
Cubic boron nitride containing thin films were deposited on (100) Si and steel substrates by electron cyclotron resonance plasma enhanced chemical vapor deposition. The films contain at least 55% of the cubic phase and are 0.5 µm thick. We investigated the dependence of hardness, stress, adherence, friction coefficient and wear resistance as a function of deposition parameters. The studied parameters are substrate bias, gas mixture composition, substrate temperature and processing pressure. These parameters are also correlated to the plasma characteristics measured by Langmuir probe, and mass spectrometer. Nanoindentation, scratch test, cantilever deflection, and ball-on-disk methods were used to evaluate quantitatively the mechanical properties. Films containing 55% of cubic phase are adherent to the two types of substrates, and have stress below 5 GPa.