AVS 46th International Symposium
    Surface Science Division Thursday Sessions
       Session SS2-ThA

Paper SS2-ThA4
Decomposition of Nickelocene on Single Crystal Surfaces

Thursday, October 28, 1999, 3:00 pm, Room 607

Session: Adsorption at Surfaces
Presenter: D.L. Pugmire, University of Nebraska, Lincoln
Authors: D.L. Pugmire, University of Nebraska, Lincoln
C.M. Woodbridge, University of Nebraska, Lincoln
M.A. Langell, University of Nebraska, Lincoln
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The decomposition mechanisms of nickelocene on several surfaces of varying reactivity have been elucidated by use of high resolution electron energy loss spectroscopy (HREELS), x-ray photoelectron spectroscopy (XPS), and temperature programmed desorption (TPD). Exposure of nickelocene to the reactive Ni(100) surface at 135 K results in its decomposition into fragments containing C-C triple bonds. When this substrate is warmed to 273 K, carbide contamination is observed. Exposure of nickelocene to NiO(100) at 135 K also yields decomposition, but with different products than those observed on Ni(100). There is no evidence for the formation of species containing C-C triple bonds on NiO(100). Instead, species with C-C double bonds result upon adsorption at 135 K and as the NiO(100) substrate is warmed to 273 K, all carbon-containing species desorb. In contrast to the reactive nature of Ni(100) and NiO(100), Ag(100) molecularly adsorbs nickelocene at 135 K with its molecular axis perpendicular to the substrate surface. When this substrate is heated, nickelocene desorbs molecularly at approximately 210 K, leaving a surface free of residual carbon. Mechanisms of nickelocene decomposition on the reactive surfaces are proposed based on the HREELS, XPS and TPD results.