AVS 46th International Symposium
    Surface Science Division Friday Sessions
       Session SS1+AS+BI-FrM

Paper SS1+AS+BI-FrM9
The Photochemistry of Model Organosulfur Compounds Adsorbed on GaAs (110): Energy-Resolved Photofragment Angular Distributions

Friday, October 29, 1999, 11:00 am, Room 606

Session: Organic Films/Self-Assembled Monolayers
Presenter: N. Camillone III, Columbia University
Authors: N. Camillone III, Columbia University
K. Adib, Columbia University
R.M. Osgood, Jr., Columbia University
Correspondent: Click to Email
Self-assembled monolayers of organothiols and related compounds hold promise for use in the semiconductor industry as ultrathin electron beam resists and precursors for the growth of II-VI materials, as well as for the growth of passivating gallium sulfide films on GaAs. An understanding of the structure and photon and electron chemistry of organothiols and related compounds is relevant to the development of these technologies. We report on our studies of the photoinduced chemistry of three model organosulfur compounds, CH@sub 3@SH, (CH@sub 3@S)@sub 2@ and CH@sub 3@SCH@sub 3@, on the (110) surface of GaAs. We find that the cross sections for the photoinduced reactions of these molecules in the adsorbed monolayers follows the trend CH@sub 3@SH > CH@sub 3@SCH@sub 3@ > (CH@sub 3@S)@sub 2@. Comparison of these measurements to photoinduced chemistry in the multilayer regime gives insight into the degree to which close proximity to the semiconductor surface perturbs the photochemistry. In addition, the structure and molecular orientation of these molecules is discussed in light of the results of energy-resolved photofragment angular distributions and low energy electron diffraction measurements. The post-irradiation chemistry of the trapped photofragments will also be discussed.