AVS 46th International Symposium
    Surface Science Division Friday Sessions
       Session SS1+AS+BI-FrM

Paper SS1+AS+BI-FrM6
Formation of Organic Layers by Cycloaddition Reactions at Germanium Surfaces

Friday, October 29, 1999, 10:00 am, Room 606

Session: Organic Films/Self-Assembled Monolayers
Presenter: C.M. Greenlief, University of Missouri, Columbia
Authors: S.W. Lee, University of Missouri, Columbia
J.S. Hovis, University of Wisconsin, Madison
R.J. Hamers, University of Wisconsin, Madison
C.M. Greenlief, University of Missouri, Columbia
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The formation of ordered organic layers on Ge(001) substrates is explored. Ge substrates are prepared by a novel method and exposed to a variety of cyclic hydrocarbons, including cyclopentene and cyclohexene. The subsequent surface interactions are followed by a variety of surface sensitive techniques. Bonding configurations are determined by photoelectron spectroscopy and scanning tunneling microscopy. The strength of surface interactions are also monitored by temperature programmed desorption. Cyclopentene and cyclohexene react with Ge dimer bonds via a [2+2] cycloaddition reaction. This reaction generates rows of the surface complex oriented along the dimer bond direction of the Ge(001) surface, which is easily observed by scanning tunneling microscopy. Experiments using other cyclic hydrocarbons and attempts at further surface modification will be discussed.