AVS 46th International Symposium
    Surface Science Division Tuesday Sessions
       Session SS-TuP

Paper SS-TuP16
The Adsorption and Thermal Decomposition of Monomethylamine Adsorbed on Si(100)

Tuesday, October 26, 1999, 5:30 pm, Room 4C

Session: Poster Session
Presenter: A.J. Dennis, University of Nevada, Reno
Authors: A.J. Dennis, University of Nevada, Reno
C.P.A. Mulcahy, University of Nevada, Reno
S.M. Casey, University of Nevada, Reno
Correspondent: Click to Email
Monomethylamine (MMA) adsorption on the Si(100)-(2x1) surface has been studied using Auger electron spectroscopy (AES), low-energy electron diffraction and temperature-programmed reaction spectroscopy (TPRS). It is shown that at room temperature MMA chemisorbs dissociatively on this surface. TPRS data show that the decomposition of the adsorbed MMA proceeds via two different mechanisms. The surface bound adsorbates can decompose via reactions that form gaseous hydrogen and hydrogen cyanide products; however, they may also decompose via a reaction channel producing gaseous ammonia. AES results show that repeated decomposition of MMA on Si(100) leads to the slow deposition of carbon- and nitrogen-based films. Kinetic analysis of the TPRS data will be discussed along with results from ab initio calculations modeling MMA adsorption on nine-atom silicon clusters.