AVS 46th International Symposium
    Flat Panel Displays Topical Conference Tuesday Sessions
       Session FP+OE+EM-TuA

Paper FP+OE+EM-TuA5
Soft Lithographic Patterning and Low Temperature Film Deposition: Methods to Fabricate Amorphous Silicon Thin Film Transistors at Low Temperature

Tuesday, October 26, 1999, 3:20 pm, Room 604

Session: Thin Film Transistor Materials and Devices
Presenter: H.-C. Jin, University of Illinois, Urbana
Authors: H.-C. Jin, University of Illinois, Urbana
J.R. Abelson, University of Illinois, Urbana
M.K. Erhardt, University of Illinois, Urbana
R.G. Nuzzo, University of Illinois, Urbana
Correspondent: Click to Email
We fabricate amorphous silicon thin film transistors on glass substrates at low temperature (125@super o@C) using "soft" lithographic patterning in place of traditional photolithography. In soft lithography, polymer templates are formed on the film by holding an elastomer block containing the desired pattern in contact with the substrate, flowing an uncured precursor into the micro-channels of the pattern, then curing the polymer. Such templates replace photoresist for all etch and deposition steps, and have been successfully used for the fabrication of multilayer device architectures with micron-scale feature resolution. It appears possible to pattern sub-micron features, as well as large area and curved substrates. In this talk, we show the patterning methodology, preliminary results for TFT devices on planar and curved substrates, and discuss future prospects.