AVS 46th International Symposium
    Applied Surface Science Division Tuesday Sessions
       Session AS-TuP

Paper AS-TuP6
An Ellipsometric Study of Plasma Deposited Thin Films

Tuesday, October 26, 1999, 5:30 pm, Room 4C

Session: Poster Session
Presenter: T. El-Agez, University of Missouri, Kansas City
Authors: T. El-Agez, University of Missouri, Kansas City
C.E. Moffitt, University of Missouri, Kansas City
H.K. Yasuda, University of Missouri, Columbia
D.M. Wieliczka, University of Missouri, Kansas City
Correspondent: Click to Email
Spectroscopic ellipsometry was used to study films produced from a plasma of trimethyl silane gas deposited on silicon substrates. In addition to the as formed plasma film, the film surfaces were treated with either an oxygen or nitrogen plasma. Ellipsometric measurements were made on the films within 1 day after deposition and as a function of time, to determine the influence of atmospheric conditions. Additionally, the films were exposed to ultra-violet light and the changes were again tracked as a function of time. Several models were used to analyze the ellipsometry results with all of them taking into account the silicon substrate and oxide layer. One kept the overall film thickness constant, i.e. the oxide grew into the deposited film. Another assumed the plasma deposited film was stable but with additional film growth due to the oxidation. And the last allowing for both film growth and modification of the plasma film. The results obtained from these models were correlated to x-ray photoelectron spectroscopy results.