AVS 46th International Symposium
    The Science of Micro-Electro-Mechanical Systems Topical Conference Monday Sessions
       Session AS+MI+VM-MoM

Paper AS+MI+VM-MoM8
Study of Tribochemical Processes at the Head-disk Interface Using Photoemission Electron Microscopy

Monday, October 25, 1999, 10:40 am, Room 610

Session: Magnetic Recording: Chemical Integration and Tribology
Presenter: S. Anders, Lawrence Berkeley National Laboratory
Authors: S. Anders, Lawrence Berkeley National Laboratory
A. Scholl, Lawrence Berkeley National Laboratory
F. Nolting, Lawrence Berkeley National Laboratory
W. Fong, University of California, Berkeley
C.-Y. Chen, University of California, Berkeley
D.B. Bogy, University of California, Berkeley
C.S. Bhatia, SSD/IBM
J. Stohr, IBM Almaden Research Center
Correspondent: Click to Email
Photoemission electron microscopy (PEEM) has been applied to study the tribochemical processes at the head-disk interface of magnetic storage devices. High resolution PEEM imaging is based on several contrast mechanisms (topographical, elemental, chemical, and various forms of polarization contrast) which makes it a unique tool for the study of tribochemical processes. We have studied surfaces of hard disks and sliders after various kinds of wear tests performed in ambient atmosphere and UHV. It was observed that the disk surface in the wear tracks is chemically modified if visible wear occurred and if a lubricant was present. In the case of unlubricated disks no chemical modifications were observed but a reduction in the hard carbon overcoat thickness. The chemical modifications consist of lubricant oxidation and fluorine removal. The lubricant oxidation and fluorine removal is enhanced with enhanced wear. It was found that degraded lubricant is transferred to the sliders and accumulated in scratches of the slider surfaces. The hard carbon overcoat on sliders was found to be reduced in thickness after the wear tests, but not chemically altered.