AVS 46th International Symposium
    The Science of Micro-Electro-Mechanical Systems Topical Conference Monday Sessions
       Session AS+MI+VM-MoM

Paper AS+MI+VM-MoM3
The Evolution of the Corrosion Process on Thin-Film Media

Monday, October 25, 1999, 9:00 am, Room 610

Session: Magnetic Recording: Chemical Integration and Tribology
Presenter: J. Ying, MMC Technology Inc.
Authors: J. Ying, MMC Technology Inc.
T. Anoikin, MMC Technology Inc.
C. Martner, MMC Technology Inc.
Correspondent: Click to Email
Thin-film hard disks have been exposed to elevated temperature/humidity, and dilute acidic vapor environment. These tests are designed to simulate possible galvanic corrosion, which, for the thin-film media, is characterized by the formation of Co and Ni containing corrosion nodules. The evolution of the corrosion process was elucidated by inducing different degrees of corrosion on the media, and these distinct corrosion stages were characterized morphologically by SEM and chemically by AES compositional analysis. In addition, an XPS chemical state study on the reactivity of Co, Cr, and Ni to ambient and chlorinated environments was conducted. A probable galvanic corrosion mechanism is proposed to understand the chemistry observed during the evolution of the corrosion process. In particular, the effects of ionic contaminants as corrosion accelerators and the role of the Cr underlayer as a corrosion-preventing barrier layer are discussed.