AVS 45th International Symposium
    Vacuum Technology Division Tuesday Sessions
       Session VT-TuM

Paper VT-TuM9
Development of New Generation Turbo Molecular Pump

Tuesday, November 3, 1998, 11:00 am, Room 329

Session: Molecular Drag Pumping
Presenter: Y. Maejima, Seiko Seiki, Japan
Authors: Y. Maejima, Seiko Seiki, Japan
C. Urano, Seiko Seiki, Japan
Correspondent: Click to Email
300mm wafer process requires extremely high process gas flow. Therefore, pumping requirements for vacuum pumps have increased up to 3,000 l/s. However, large pumps have disadvantages such as heavy weight, effect in case of failure. Our solution and concept for the new generation vacuum pump is to develop a 2,000 l/s dimension pump with higher performance than a 3,000 l/s pump at process pressure range. (from 1 Pa to 3 Pa) To accomplish this development, our target was to maintain pumping performance down to 5 Pa. We have simulated the influence of turbine blade parameter (blade length, dimension, shape) for maximum gas flow performance.