AVS 45th International Symposium
    Surface Science Division Monday Sessions
       Session SS-MoP

Paper SS-MoP11
Analysis of Desorption Behavior of Sulfur from Pd by Temperature Programmed XPS

Monday, November 2, 1998, 5:30 pm, Room Hall A

Session: Surface Science Division Poster Session
Presenter: K. Dohmae, TOYOTA Central R&D Labs, Inc., Japan
Correspondent: Click to Email

Desorption of sulfur in oxygen gas from polycrystalline palladium plate was investigated by temperature programmed X-ray photoelectron spectroscopy (TP-XPS). The temperature programmed experiments in a range from room temperature to 773K were performed in an ambience of O@sub 2@ gas at 1x10@super -6@ Pa under a base pressure of 2x10@super -8@ Pa. As the initial coverage of sulfur on Pd increases in the range below 0.5 ML, the temperature that the quantity of sulfur on Pd decrease to half of its initial value becomes higher. Over 0.5 ML of the initial coverage of sulfur, the coverage of sulfur on Pd remained more than 0.5 ML at 773K, though the adsorbed sulfur decreases slightly as the temperature went up. The results were compared with calculations of Langmuir-Hinshelwood model with an assumption that the adsorbed sulfur react with the adsorbed oxygen on Pd and desorbe as sulfur dioxide molecule from Pd. The desorption behavior of sulfur in the experiments was well explained by the calculation model. The adsorption and desorption behavior of oxygen did not much agree with the calculations. Though the calculations suggest that the quantity of adsorbed oxygen on Pd decreased when the sulfur desorbe from Pd, the quantity of adsorbed oxygen did not decrease at the time in the experiments. Furthermore, total quantity of adsorbed sulfur and oxygen on Pd became over 1 ML at higher initial coverage of sulfur than 0.5 ML. They suggest that adsorbed sulfur on Pd affects the ability of adsorption of oxygen onto Pd.