AVS Short Course Webinar

Atomic Layer Deposition (ALD):
Basic Principles, Characterizations, and Applications

Thursday, March 15, 2018
1:00-5:00 p.m. (EDT)

The AVS Short Course Webinar focusing on on Atomic Layer Deposition (ALD) will be held on Thursday March 15 at 1:00 PM eastern time. This webinar will be taught by AVS Instructor, Robert K. Grubbs. Dr. Grubbs has been working in the field ALD for 20 years and has applied the ALD process to solve myrid technical challenges in the semiconductor industry and in the area of national security.

This webinar on Atomic Layer Deposition (ALD) is for anyone who wants to know specific details about how the ALD process works and how to implement ALD in a laboratory setting. The webinar will cover the basic aspects of the chemical mechanism of ALD and how that leads to the unique and potent properties of an ALD process. Multiple examples of ALD chemistry will be covered as well as reactor design, chemical precursor properties, plasma ALD, and molecular layer deposition (MLD).


Who should attend: Technicians, graduate students and engineers who are working with ALD and want to know more about the subject and for the novice who wants to become more familiar with the exciting and ever expanding field of Atomic Layer Deposition.
 


Syllabus: Learn More


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Cost:
$200.00/person

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