Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2018)
    Thin Films Tuesday Sessions
       Session TF-TuM

Invited Paper TF-TuM11
Thin-Film Alchemy: Engineering Oxide Films to Unleash their Hidden Properties

Tuesday, December 4, 2018, 11:20 am, Room Naupaka Salons 4

Session: Innovations in the Development of Multifunctional Thin Films
Presenter: Darrell G. Schlom, Cornell University
Correspondent: Click to Email

Guided by theory, unparalleled properties—those of hidden ground states—are being unleashed by engineering oxides at the atomic level. This engineering includes strain engineering, dimensional confinement, and defect engineering. Using these thin-film tricks, materials that are not ferroelectric or ferromagnetic in their unstrained state can be transmuted into ferroelectrics, ferromagnets, or materials that are both at the same time. Similarly, new tunable dielectrics with unparalleled performance have been created. Our studies reveal details about the microscopic growth mechanism of these phases, which are relevant to preparing multicomponent oxide heterostructures with atomic precision. A new era for engineering functional oxide thin films for electronics is upon us: oxides by design. This work was performed in collaboration with the coauthors listed in the references below.

C.H. Lee, N.D. Orloff, T. Birol, Y. Zhu, V. Goian, E. Rocas, R. Haislmaier, E. Vlahos, J.A. Mundy, L.F. Kourkoutis, Y. Nie, M.D. Biegalski, J. Zhang, M. Bernhagen, N.A. Benedek, Y. Kim, J.D. Brock, R. Uecker, X.X. Xi, V. Gopalan, D. Nuzhnyy, S. Kamba, D.A. Muller, I. Takeuchi, J.C. Booth, C.J. Fennie, and D.G. Schlom, “Exploiting Dimensionality and Defect Mitigation to Create Tunable Microwave Dielectrics,” Nature 502 (2013) 532–536.

C.H. Lee, V. Skoromets, M.D. Biegalski, S. Lei, R. Haislmaier, M. Bernhagen, R. Uecker, X.X. Xi, V. Gopalan, X. Martí, S. Kamba, P. Kužel, and D.G. Schlom, Appl. Phys. Lett. 102 (2013) 082905.

Y.F. Nie, Y. Zhu, C.-H. Lee, L.F. Kourkoutis, J.A. Mundy, J. Junquera, P. Ghosez, D.J. Baek, S. Sung, X.X. Xi, K.M. Shen, D.A. Muller, and D.G. Schlom, “Atomically Precise Interfaces from Non-Stoichiometric Deposition,” Nat. Commun. 5 (2014) 4530.

V. Goian, S. Kamba, N. Orloff, T. Birol, C.H. Lee, D. Nuzhnyy, J.C. Booth, M. Bernhagen, R. Uecker, and D.G. Schlom, “Influence of the Central Mode and Soft Phonon on the Microwave Dielectric Loss near the Strain-Induced Ferroelectric Phase Transitions in Srn+1TinO3n+1,” Phys. Rev. B 90 (2014) 174105.

A.M. Hagerstrom, X. Lu, N.M. Dawley, H.P. Nair, J. Mateu, R.D. Horansky, C.A.E. Little, J.C. Booth, C.J. Long, D.G. Schlom, and N.D. Orloff, “Sub-Nanosecond Tuning of Microwave Resonators Fabricated on Ruddlesden-Popper Dielectric Thin Films,” Adv. Mater. Technol. (2018) 1800090. https://doi.org/10.1002/admt.201800090

N.M. Dawley, E.J. Marksz, A.M. Hagerstrom, M.E. Holtz, G.H. Olsen, J. Zhang, C.J. Long, J.C. Booth, C.J. Fennie, D.A. Muller, N.D. Orloff, and D.G. Schlom, “Applying Chemistry to Make Today’s Best Tunable Millimeter Wave Dielectric even Better” (unpublished).