Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2018)
    Nanomaterials Tuesday Sessions
       Session NM-TuM

Paper NM-TuM11
Molecular Dynamics Investigation for Chemical Effects of Nanobubble Collapse on Precision Polishing

Tuesday, December 4, 2018, 11:20 am, Room Naupaka Salon 5

Session: Nanofabrication and Nanodevices
Presenter: Yoshimasa Aoyama, Tohoku University, Japan
Authors: Y. Aoyama, Tohoku University, Japan
N. Miyazaki, Tohoku University, Japan
Y. Ootani, Tohoku University, Japan
N. Ozawa, Tohoku University, Japan
M. Kubo, Tohoku University, Japan
Correspondent: Click to Email

For manufacturing high-performance semiconductor devices, the fabrication of a highly-planar surface is important. As the planarization method, chemical mechanical polishing (CMP) is used for efficient processing. The efficient process leads cost-savings. Therefore, the design of more efficient and more precise CMP process is required. Then, Aida et al. have recently reported that the nanobubble contributes to CMP process[1]. In this polishing process, the water hammer shock is regarded as the elemental process, which brings the jet stream when the nanobubble collapses[2]. From their study, effects of the jet would depend on the solvents around the nanobubble and the inner gaseous species of the nanobubble. However, the details of chemical relationship among CMP process, solvents, and gaseous species are unclear. Therefore, understanding the atomistic CMP mechanism with nanobubble and the chemical effects of solvents and gaseous species in nanobubble collapse phenomenon are required to establish more efficient CMP process. In this study, we performed nanobubble collapse simulation by molecular dynamics method using reactive force field, which is possible to simulate the formation and dissociation of chemical bonds.

First, we prepared the simulation model with vacuum nanobubble in the water solvent and the simulation model without nanobubble. A vacuum nanobubble is modeled by removing the water molecules as the spherical shape. Then, we performed nanobubble collapse simulation and applied a shock for the substrate surface by using “momentum mirror”[3]. From these simulations, we found that the jet was generated in the model with a nanobubble, and this jet brought larger plastic deformation on the substrate, indicating that the nanobubble increased the efficiency of CMP process. Second, in order to investigate the effects of gaseous species in the nanobubble, we prepared nanobubble models with various gaseous species. By determining the density of gas molecules in the nanobubble to satisfy the Young-Laplace law, we succeeded in creating oxygen and nitrogen nanobubble stably. By this procedure, we got to be able to fabricate various gaseous nanobubbles stably and simulate nanobubble collapse process under various solvents and gaseous species. In the conference, we are going to report the atomistic CMP mechanism and chemical effects of solvents and gaseous species in nanobubble collapse simulation.

[1] H. Aida et al., Precision Engineering, 40 (2015) 81.

[2] C. D. Ohl et al., Phys. Rev. Lett., 90 (2003) 214502.

[3] B. L. Holian et al., Phys. Rev. A, 37 (1988) 2562.