Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2016)
    Thin Films Wednesday Sessions
       Session TF-WeP

Paper TF-WeP23
Effect of Substrate Temperature on the Mechanical Properties and Structure of Sputtered Titanium Nitride Film by a Pure Nitrogen Plasma

Wednesday, December 14, 2016, 4:00 pm, Room Mauka

Session: Thin Films Posters Session II
Presenter: Chang-Hyun Lee, Catholic University of Daegu, Republic of Korea
Authors: C.-H. Park, Catholic University of Daegu, Republic of Korea
B.-S. Jang, Catholic University of Daegu, Republic of Korea
C.-H. Lee, Catholic University of Daegu, Republic of Korea
S.-Y. Son, Pohang University of Science and Technology, Republic of Korea
B. Kim, Catholic University of Daegu, Republic of Korea
H.-M. Kim, Catholic University of Daegu, Republic of Korea
Correspondent: Click to Email

Titanium nitride (TiN) films were prepared by rf magnetron sputtering technique. The depositions were carried out by a pure N2 plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and water contact angle have been investigated. XRD studies revealed that TiNx films grown at temperatures more than 360°C exhibits an intense compressive stress as compared with the films grown at temperatures less than 360°C. The orientation of TiNx films changes toward (111) orientation at 360°C due to increased ion bombardment which favors low surface energy at (111) orientation. The increase of Ts, which means the distance between target and substrate, increases the mobility of adatoms promoting closed packing structures in near thermodynamic equilibrium conditions. Thus, for high adatom mobility the TiNx films expected to grow along the (111) orientation corresponding to that with the lowest surface free energy. On the other hand, for low adatom mobility the preferred orientation is the (002) in which the highest number of atoms per unit area can be incorporated at low energy sites. The mechanical properties of TiNx films grown at a pure N2 atmosphere strongly dependent on the Ts. The highest hardness and the smallest friction coefficient of 26 GPa and μ=0.13, respectively were in a TiNx film deposited at 400°C. This film was found to be accompanied by a water repellent surface.

This research was financially supported by the Ministry of Education (MOE) and National Research Foundation of Korea(NRF) through the Human Resource Training Project for Regional Innovation (No. 2015H1C1A1035619). This work (Grants No. C0350891) was supported by Business for Cooperative R&D between Industry, Academy, and Research Institute funded Korea Small and Medium Business Administration in 2015.