| Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2016) | |
| Nanomaterials | Wednesday Sessions |
| Session NM-WeP |
| Session: | Nanomaterials Poster Session |
| Presenter: | Mohsina Islam, Chemtrace Analytical Testing and Solutions |
| Authors: | M. Islam, Chemtrace Analytical Testing and Solutions S. Liu, Chemtrace Analytical Testing and Solutions |
| Correspondent: | Click to Email |
In Semiconductor industry, the silicon based nanoparticles showed great promises in various applications like thin- film transistors for liquid crystal displays (LCD TFTS), solar cells and printed semiconductor materials because of its superior properties such as feasibility of surface functionalization, size dependent multicolor light emission and stability against photobleaching.
In this work a novel analytical method was developed for the determination of trace metal impurities in silicon based nanoparticles dispersed in solvent mixture using Inductively Coupled Plasma Mass Spectrometry (ICP-MS). For this purpose silicon nanoparticles with metal dopants, e.g, phosphorous and boron dopant nanoparticles dispersed in various solvents like Isopropyl alcohol, PGMEA and Terpineol were studied. The sample was prepared by evaporation to solvent boiling point followed by Silicon dissolved and digestion with mixed acid solution. The trace metal (TM) residue was dissolved and reconstituted in dilute acid solution which is analysed through ICP-MS. Following the same method, a spiked sample was prepared with known TM level in the range of 3.0 to 6.0 ppb. The spike recoveries with this method is in the range of 75 to 125% for all elements. The dopant levels were measured as 0.05-0.3 wt.% for B and P following the dissolution and dilution of sample in mixed acid solution. The method detection limit as low as 0.1 to 10 ppb were achieved for different TM contaminants.