Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2016)
    Nanomaterials Tuesday Sessions
       Session NM-TuP

Paper NM-TuP18
Adsorption and Thermal Processes of NO with Silicene on ZrB2/Si(111)

Tuesday, December 13, 2016, 4:00 pm, Room Mauka

Session: Nanomaterials Poster Session
Presenter: Jun Yoshinobu, ISSP, Univ. of Tokyo, Japan
Authors: J. Yoshinobu, ISSP, Univ. of Tokyo, Japan
K. Mukai, Univ. of Tokyo, Japan
H. Ueda, Univ. of Tokyo, Japan
S. Yoshimoto, Univ. of Tokyo, Japan
C. Lee, Univ. of Tokyo, Japan
T. Ozaki, Univ. of Tokyo, Japan
A. Fleurence, Japan Advanced Institute of Science and Technology, Japan
Y. Yamada-Takamura, Japan Advanced Institute of Science and Technology, Japan
Correspondent: Click to Email
We investigated the adsorption and thermal processes of NO with silicene on ZrB2/Si(111) using synchrotron radiation X-ray photoelectron spectroscopy (XPS) and density-functional theory (DFT) calculations. NO is dissociatively adsorbed on the silicene surface at 300 K. The substitutional adsorption of a nitrogen atom to a silicon site in the silicene honeycomb predominantly occurs. An oxygen atom is most probably inserted between two Si atoms of the silicone honeycomb. With increasing NO exposure, the honeycomb structure of silicene is destroyed and three dimensional silicon oxinitride may be formed. By heating above 900 K, the oxide species start to desorb from the surface most probably as SiO species. After heating to 1053 K, no oxygen is observed by XPS; nitrogen species remain on the surface. At the same time, the bare silicene domains are restored. The substitutional nitridation of silicene including Si3≡N species may provide a two-dimensional SiN honeycomb sheet on the surface.