| AVS 64th International Symposium & Exhibition | |
| Applied Surface Science Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS+BI+SA+SS-ThM1 Invited Paper In Situ Investigation of the Dynamic Transformations of Model Catalyst Surfaces using Ambient Pressure XPS Iradwikanari Waluyo, Brookhaven National Laboratory |
| 8:40am | AS+BI+SA+SS-ThM3 Observation of Oxygen Binding on PGM-free Electrocatalysts by Ambient Pressure XPS and XAS Kateryna Artyushkova, University of New Mexico, M.J. Dzara, S. Pylypenko, Colorado School of Mines, P. Atanassov, University of New Mexico |
| 9:00am | AS+BI+SA+SS-ThM4 In situ Monitoring of Electrochemically Generated Carbene by XPS Pinar Aydogan Gokturk, S.E. Donmez, Y.E. Turkmen, B. Ulgut, S. Suzer, Bilkent University, Turkey |
| 9:20am | AS+BI+SA+SS-ThM5 The Influence of Water on the Ionic Liquid-Vapor Interface John Newberg, University of Delaware, M.B. Shiflett, University of Kansas, A. Broderick, Y. Khalifa, University of Delaware |
| 9:40am | AS+BI+SA+SS-ThM6 Ambient Pressure XPS Studies of Model N-C and Fe-N-C Catalysts Under Oxygen Environment Michael Dzara, Colorado School of Mines, K. Artyushkova, University of New Mexico, C. Ngo, M.B. Strand, J. Hagen, S. Pylypenko, Colorado School of Mines |
| 11:00am | AS+BI+SA+SS-ThM10 Real-time Photoelectron Spectroscopy Observation of Oxidation and Reduction Kinetics of Ni(111) Surface Ryo Taga, S. Ogawa, Y. Takakuwa, Tohoku University, Japan |
| 11:20am | AS+BI+SA+SS-ThM11 Comparison of Initial Oxidation Kinetics between p- and n-type Si(001) Surfaces Studied by Real-time Photoelectron Spectroscopy Yuki Sekihata, S. Ogawa, Tohoku University, Japan, A. Yoshigoe, JAEA, Japan, R. Taga, Tohoku University, Japan, S. Ishidzuka, National Institute of Technology, Akita College, Japan, Y. Takakuwa, Tohoku University, Japan |
| 11:40am | AS+BI+SA+SS-ThM12 Co-Pyrphyrin on Cu2O(111) and TiO2(110): Properties and Stability under Near Operando Conditions Zbynek Novotny, W.-D. Zabka, M. Hotz, D. Leuenberger, University of Zurich, Switzerland, L. Artiglia, F. Orlando, M. Ammann, Paul Scherrer Institut (PSI), Switzerland, J. Osterwalder, University of Zürich, Switzerland |