AVS 64th International Symposium & Exhibition
    Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic Tuesday Sessions
       Session SA+AS+HC+SS-TuA

Paper SA+AS+HC+SS-TuA9
Non-destructive Depth Profiling of LaAlO3/SrTiO3 Interfaces

Tuesday, October 31, 2017, 5:00 pm, Room 9

Session: Frontiers of Photoelectron Spectroscopy: Surface & Interface Processes with Variable Depth Probe, High Spatial or Temporal Resolution
Presenter: Conan Weiland, NIST
Authors: C. Weiland, NIST
A.K. Rumaiz, National Synchrotron Light Source II, Brookhaven National Laboratory
G.E. Sterbinsky, Advanced Photon Source, Argonne National Laboratory
J.C. Woicik, NIST
Correspondent: Click to Email

The interface between LaAlO3 (LAO) and SrTiO3 (STO) is known to be conductive, even though both LAO and STO are insulators. The interface may also host a variety of interesting phenomena such as a two-dimensional electron gas, ferromagnetism, and superconductivity. Various mechanisms have been proposed to explain the formation of the conductive interface, including the 'polar catastrophe', wherein the polar discontinuity at the interface leads to a diverging potential allowing electronic reconstruction, oxygen vacancies at the interface or at the LAO surface, and chemical intermixing, amongst others.

Synchrotron-based variable kinetic energy x-ray photoelectron spectroscopy (VKE-XPS) is a unique and powerful tool to non-destructively probe the chemical and electronic structure of buried interfaces such as that between LAO and STO. Using VKE-XPS, we have analyzed a series of LAO films on STO and have observed compositional variations in the LAO films as a function of depth: Al-enrichment occurs at the LAO surface. Additionally, an electric field was observed in some samples. In this presentation we will discuss the relevance of these results on the formation of conductive LAO/STO interfaces.