| AVS 64th International Symposium & Exhibition | |
| MEMS and NEMS Group | Tuesday Sessions |
| Session MN-TuP |
| Session: | MEMS/NEMS Poster Session |
| Presenter: | Matthijn Dekkers, Solmates, Netherlands |
| Authors: | J.M. Dekkers, Solmates, Netherlands J.A. Janssens, Solmates, Netherlands |
| Correspondent: | Click to Email |
It is well known that Pulsed Laser Deposition (PLD) is a very flexible and versatile technique allowing fast optimization of new and complex material thin films. The unique features of PLD allow for the integration of “Beyond Moore” materials in CMOS and new devices. However, mainly because of the sample size, the developed materials and processes in PLD research tools only just make it into demonstrator devices. In order to make it into commercial applications, next generation PLD equipment is needed to bridge the gap between demonstrator and the prototype – pilot – production stages.
The Solmates PLD platform is the next step beyond fundamental PLD research. The reliable hardware is flexible for fast process optimization and allows uniform thin film deposition up to 200 mm diameter with high reproducibility. The automated software ensures easy operation and stable performance. These characteristics enable the integration of PLD thin films in applications for (pilot) production and commercialization.
In this contribution the latest performance and specifications of Solmates PLD platform are addressed. Data on stability and reproducibility of wafer scale deposition of PZT thin films with excellent properties will be presented. Furthermore, two qualified processes Indium Tin Oxide and Aluminum Oxide thin films will be used to show some key capabilities of PLD such as damage free deposition on organic electronics or control of thin films density and microstructure for optical or sensing applications.