AVS 64th International Symposium & Exhibition
    Applied Surface Science Division Thursday Sessions
       Session AS-ThP

Paper AS-ThP4
Ambient Pressure X-ray Photoelectron Spectroscopy of the III-V Semiconductor/Water Interface

Thursday, November 2, 2017, 6:30 pm, Room Central Hall

Session: Applied Surface Science Poster Session
Presenter: Pitambar Sapkota, University of Notre Dame
Authors: P.S. Sapkota, University of Notre Dame
S. Ptasinska, University of Notre Dame
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Along with the intense study of semiconductors for promising photovoltaic application, these materials are also used for harvesting solar energy, where energy is stored in the form of chemical fuels. This is through photo-electrochemical (PEC) solar cells, which are being extensively explored recently. Performance and stability of such PEC devices largely depend on the electronic properties and chemistry at the interface of semiconductors and water. Oxidation of the semiconductor surface during operation has been shown to be the major cause of degradation in action and durability of such devices. This research has studied the interactions of water with the III-V semiconductor surface during operando condition using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). The results obtained through this study help to determine the reaction pathway leading to oxidation and its extent on the surface. This knowledge can provide deeper insight into the tuning parameters necessary to obtain better operating and more lasting PEC devices.