AVS 64th International Symposium & Exhibition
    Applied Surface Science Division Tuesday Sessions
       Session AS+TF-TuA

Paper AS+TF-TuA8
Practical Considerations of Different Ion Sources for Industrial Applications: The Good, the Bad, and the Indifferent

Tuesday, October 31, 2017, 4:40 pm, Room 13

Session: Problem Solving Using Surface Analysis in the Industrial Laboratory
Presenter: William Stickle, HP Inc.
Authors: W.F. Stickle, HP Inc.
C.N. Young, HP Inc.
M.D. Johnson, HP Inc.
B. Schmidt, Physical Electronics USA
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In recent years advances in ion gun technology have resulted in the routine application of cluster ion sources for analyses in industrial R&D labs. Most industrial laboratories study a wide variety of material systems ranging from polymers to inorganic thin films; many of these material systems require analysis not just of the as received surface, but also of and through the depth of a thin film. The purpose of this talk is to compare and contrast the benefits and drawbacks of performing routine XPS analyses using a mono atomic argon ion source compared with a C60+ ion source and an argon gas cluster ion source. From a practical standpoint, i t is important to understand the sputter induced chemistry that may be created by these various sources and the trade-offs for applying these different primary ion sources for routine surface chemical analyses. The effects of preferential sputtering and chemical changes or reactions of metal oxides will be discussed. Several different material systems are examined and discussed by comparing the information obtained using mono atomic argon, an argon gas cluster source and a C60+ ion source for enhancing and clarifying ‘routine’ analyses. The different types of samples to be discussed will include polymers, fluoropolymer systems, amorphous metals and their oxides and multilayer thin films.