AVS 64th International Symposium & Exhibition
    2D Materials Focus Topic Thursday Sessions
       Session 2D+AS+SS-ThA

Paper 2D+AS+SS-ThA6
Interaction of an Energetic Ar Molecular Cluster Beam with Graphene

Thursday, November 2, 2017, 4:00 pm, Room 15

Session: Dopants, Defects, and Interfaces in 2D Materials
Presenter: Songkil Kim, Oak Ridge National Laboratory
Authors: S. Kim, Oak Ridge National Laboratory
A.V. Ievlev, Oak Ridge National Laboratory
J. Jakowski, Oak Ridge National Laboratory
I. Vlassiouk, Oak Ridge National Laboratory
M.J. Burch, Oak Ridge National Laboratory
C.C. Brown, Oak Ridge National Laboratory
A. Belianinov, Oak Ridge National Laboratory
B.G. Sumpter, Oak Ridge National Laboratory
S. Jesse, Oak Ridge National Laboratory
O.S. Ovchinnikova, Oak Ridge National Laboratory
Correspondent: Click to Email

Manipulation of low dimensional nanomaterials provides intriguing opportunities to design new functional materials as well as to develop next-generation device applications. To manipulate properties of low dimensional nanomaterials, extensive study has been conducted so far for interaction of energetic particles with low dimensional nanomaterials. However, most of the research has been focused on utilizing electron or light/heavy ion beams to study irradiation effects on alternation of structural, mechanical and electrical properties of nanomaterials. In this study, we investigated the effect of Argon molecular cluster beam irradiation on both defect formation and removal of organic contaminants on graphene. An Argon cluster beam was generated using the Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) combined with Atomic Force Microscopy (AFM). The ToF-SIMS allows for conducting in-situ monitoring of defect formation as well as organic contaminants removal. This leads to accomplishments of a high degree of controls over modification of graphene. A systematic study has been conducted to provide in-depth understanding about defect formation of graphene by synergistic theoretical and experimental approaches. Raman spectra clearly indicate that suspended graphene is more susceptible to Ar cluster beam irradiation than supported graphene on a SiO2/Si substrate under the same irradiation conditions. The underlying mechanisms for the experimentally observed phenomena are demonstrated by theoretical analysis using the first-principles molecular dynamics calculations.

This work was supported by the Oak Ridge National Laboratory’s Center for Nanophase Materials Sciences (CNMS), which is a U.S. Department of Energy, Office of Science User Facility.