AVS 62nd International Symposium & Exhibition
    Thin Film Wednesday Sessions

Session TF+EN-WeM
ALD for Energy

Wednesday, October 21, 2015, 8:00 am, Room 111
Moderators: Jesse Jur, North Carolina State University, Angel Yanguas-Gil, Argonne National Lab


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF+EN-WeM1
Photovoltage Design for ALD Metal Oxide Protected Solar-Water-Splitting Photoanodes
Andrew Scheuermann, J.P. Lawrence, K.W. Kemp, O.L. Hendricks, Stanford University, A. Walsh, I. Povey, M.E. Pemble, P.K. Hurley, Tyndall National Institute, C.E.D. Chidsey, P.C. McIntyre, Stanford University
8:20am TF+EN-WeM2
Activity and Thermal Stability Enhanced Platinum catalysts with Nano-scale Oxide Coating via Atomic Layer Deposition
Kun Cao, J.M. Cai, B. Shan, R. Chen, Huazhong University of Science and Technology, Wuhan, China
8:40am TF+EN-WeM3
Passivation of Highly-doped c-Si Solar Cell Surfaces by Atomic Layer Deposition
Bas van de Loo, Eindhoven University of Technology, Netherlands, J. Melskens, Eindhoven University of Technology, G.J.M. Janssen, ECN Solar Energy, K.R.C. Mok, L.K. Nanver, Delft University of Technology, A.H.G. Vlooswijk, Tempress Systems, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
9:00am TF+EN-WeM4
Low Temperature Plasma-Assisted Atomic Layer Deposition of TiO2 Blocking Layers for Organo-Metal Halide Perovskite Solar Cells
V. Zardetto, Eindhoven University of Technology, The Netherlands, F. di Giacomo, G. Lucarelli, T.M. Brown, A. di Carlo, S. Licoccia, A. D'Epifanio, University of Rome "Tor Vergata", Italy, W.M.M. Kessels, Mariadriana Creatore, Eindhoven University of Technology, The Netherlands
9:20am TF+EN-WeM5
Ultra-thin transition Metal Oxide-titania Alloy Coatings for Water Oxidation by Atomic Layer Deposition
Olivia Hendricks, C.E.D. Chidsey, P.C. McIntyre, Stanford University
9:40am TF+EN-WeM6
Atomic Layer Deposition of Nickel-Iron-Oxide Catalysts for Photoelectrochemical Splitting of Water
Adrie Mackus, K.L. Pickrahn, J.G. Baker, S.F. Bent, Stanford University
11:00am TF+EN-WeM10 Invited Paper
From Atom to Solid: The Structure of Amorphous ALD Thin Films and Nanolaminates
Angel Yanguas-Gil, Argonne National Laboratory
11:40am TF+EN-WeM12
Inorganic Functionalization of Colloidal Quantum Dot Solar Cells through ALD Infilling
Axel Palmstrom, P. Santra, S.F. Bent, Stanford University
12:00pm TF+EN-WeM13
Integrating Atomic Layer Deposited Lithium-Containing Thin Films for Lithium-ion Battery Applications
J. Cho, Trevor Seegmiller, J. Lau, L. Smith, J. Hur, B. Dunn, J.P. Chang, University of California at Los Angeles