| AVS 62nd International Symposium & Exhibition | |
| Advanced Surface Engineering | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SE+AS+NS+TR-MoM1 Reactively Sputter Deposited Ternary AlN-based Coatings Joerg Patscheider, Empa, Switzerland, E. Lewin, Uppsala University, Sweden |
| 8:40am | SE+AS+NS+TR-MoM2 Mo2BC Coatings for Metal Forming: Interactions Between Tool Surface and Aluminium by Theory and Experiment Jochen Schneider, RWTH Aachen University, Germany, H. Bolvardi, Oerlikon Balzers, Liechtenstein, D. Music, RWTH Aachen University, Germany |
| 9:00am | SE+AS+NS+TR-MoM3 Molecular Dynamics Simulations of TiN/TiN(001) Growth Daniel Edström, D.G. Sangiovanni, V. Chirita, L. Hultman, Linköping University, Sweden, J.E. Greene, I. Petrov, University of Illinois at Urbana Champaign |
| 9:20am | SE+AS+NS+TR-MoM4 Stress Design of Multi-layered Coatings Wolfgang Seidl, Christian Doppler Laboratory for Application Oriented Coating Development at the Institute of Materials Science and Technology, Vienna University of Technology, 1040 Vienna, Austria, M. Arndt, Oerliko Balzers, Oerlikon Surface Solutions AG, 9496 Balzers, Liechtenstein, P. Polcik, Plansee Composite Materials GmbH, 86983 Lechbruck am See, Germany, P.H. Mayrhofer, Vienna University of Technology, Austria |
| 9:40am | SE+AS+NS+TR-MoM5 Invited Paper Atomistic Guided Development of Hard Coatings and Thin Films for Severe Applications Paul Mayrhofer, Vienna University of Technology, Austria |
| 10:40am | SE+AS+NS+TR-MoM8 Crystallographic Stabilization of δ-WC Thin Films by Alloying with B, using Reactive Magnetron Sputtering of W in Trimethylboron (CH3)3B Hans Högberg, L. Tengdelius, M. Samuelsson, G. Greczynski, F. Eriksson, L. Hultman, Linköping University, Sweden |
| 11:00am | SE+AS+NS+TR-MoM9 Epitaxial and Polycrystalline WNx and MoNx Films Deposited by Reactive DC Magnetron Sputtering Brian Ozsdolay, K. Balasubramanian, Rensselaer Polytechnic Institute, C.P. Mulligan, U.S. Army Armament Research Development & Engineering Center, Benét Laboratories, M.J. Guerette, L. Huang, D. Gall, Rensselaer Polytechnic Institute |
| 11:20am | SE+AS+NS+TR-MoM10 Phase Stability and In Situ Growth Stresses in Thin Cu/Nb Multilayered Films Qianying Guo, L. Wan, R.L. Martens, G.B. Thompson, University of Alabama |
| 11:40am | SE+AS+NS+TR-MoM11 Droplets in Cathodic Arc Evaporated (Al,Cr)2O3-based Coatings and the Nucleation of Dedicated Crystalline Structures Christian M. Koller, CDL AOS, TU Wien, Austria, R. Hahn, TU Wien, Austria, J. Ramm, Oerlikon Balzers, Oerlikon Surface Solutions AG, Liechtenstein, S. Kolozsvári, Plansee Composite Materials GmbH, Germany, P.H. Mayrhofer, CDL AOS, TU Wien, Austria |