AVS 62nd International Symposium & Exhibition
    Nanometer-scale Science and Technology Thursday Sessions

Session NS+MN-ThM
Nanopatterning and Nanolithography/Nanoscale Mechanics

Thursday, October 22, 2015, 8:00 am, Room 212B
Moderators: Stephane Evoy, University of Alberta, Jeremy Robinson, Naval Research Laboratory


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am NS+MN-ThM1
Electron Stimulated Desorption and Raman Investigations of HafSOx Inorganic Resists
Ryan Frederick, G. Herman, Oregon State University
8:20am NS+MN-ThM2
Fundamental Limits of Material Toughening with Molecularly Confined Polymers
Scott Isaacson, Stanford University, K. Lionti, W. Volksen, T.P. Magbitang, IBM Almaden Research Center, R.H. Dauskardt, Stanford University, G. Dubois, IBM Almaden Research Center
8:40am NS+MN-ThM3 Invited Paper
Nanomanufacturing from Silicon to DNA
James Liddle, Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899-6203
9:20am NS+MN-ThM5
Pattern Formation by Ion Beam Sputtering on Thermally Treated Ge Surfaces Implanted with Si Ions
AngélicaGuadalupe Hernández, Y. Kudriavtsev, CINVESTAV-IPN, Mexico
9:40am NS+MN-ThM6
Poor Q-factor? - No Problem: Nano-Optomechanical Mass Sensing in Ambient Conditions
Swapan Roy, V.T.K. Sauer, A. Venkatasubramanian, W.K. Hiebert, University of Alberta and The National Institute for Nanotechnology, Canada
11:00am NS+MN-ThM10 Invited Paper
Frequency Division Using a Micromechanical Resonance Cascade
K. Qalandar, M. Sharma, B. Gibson, Kimberly Turner, University of California, Santa Barbara
11:40am NS+MN-ThM12 Invited Paper
Single-Molecule Analysis with Nanomechanical Systems
Michael Roukes, California Institute of Technology