AVS 62nd International Symposium & Exhibition | |
2D Materials Focus Topic | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | 2D+EM+IS+MC+NS+SP+SS-WeA1 The Effect of Defect Density on the Mechanical Properties of Graphene Jonathan Willman, J.M. Gonzales, University of South Florida, R. Perriot, Los Alamos National Laboratory, I.I. Oleynik, University of South Florida |
2:40pm | 2D+EM+IS+MC+NS+SP+SS-WeA2 Investigation of Grain Boundaries in CVD Grown MoS2 Kolyo Marinov, D. Ovchinnikov, D. Dumcenco, A. Kis, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland |
3:00pm | 2D+EM+IS+MC+NS+SP+SS-WeA3 Invited Paper Polycrystalline 2D Materials: Atomic Structure and Electronic Transport Properties Oleg Yazyev, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland |
4:20pm | 2D+EM+IS+MC+NS+SP+SS-WeA7 Defects Compensation and Refining Optical Luminescence in Organic/Transition Metal Dichalcogenide Heterostructure J.H. Park, UC San Diego, A.M. Sanne, H.C.P. Movva, UT-Austin, S. Vishwanath, Cornell University, Il Jo Kwak, UC San Diego, H. Xing, Cornell University, J. Robertson, University of Cambridge, UK, S.K. Banerjee, UT-Austin, A.C. Kummel, UC San Diego |
4:40pm | 2D+EM+IS+MC+NS+SP+SS-WeA8 Reactivity and Wettability of PVD Metals on 2D Transition Metal Dichalcogenides Christopher Smyth, S. McDonnell, R. Addou, H. Zhu, C.L. Hinkle, R.M. Wallace, University of Texas at Dallas |
5:00pm | 2D+EM+IS+MC+NS+SP+SS-WeA9 Invited Paper Defects and Boundaries in 2D Materials: Correlating Electronic Properties to Atomic Structures An-Ping Li, Oak Ridge National Laboratory |
5:40pm | 2D+EM+IS+MC+NS+SP+SS-WeA11 Metal Ion Intercalated 2D Materials as Transparent Electrodes Jiayu Wan, W. Bao, F. Gu, University of Maryland, College Park, M. Fuhrer, Monash University, Malaysia, L. Hu, University of Maryland, College Park |
6:00pm | 2D+EM+IS+MC+NS+SP+SS-WeA12 Oxygen Reduction Reaction on Nitrogen-doped Graphene Jun Nakamura, The University of Electro-Communications (UEC-Tokyo), Japan, A. Ichikawa, H. Matsuyama, A. Akaishi, The University of Electro-Communications (UEC-Tokyo) |