AVS 62nd International Symposium & Exhibition | |
Vacuum Technology | Tuesday Sessions |
Session VT-TuP |
Session: | Vacuum Technology Poster Session |
Presenter: | Kohei Kuroshima, Osaka Vacuum, Ltd., Japan |
Authors: | K. Kuroshima, Osaka Vacuum, Ltd., Japan M. Iguchi, Osaka Vacuum, Ltd., Japan S. Sugimoto, Osaka Vacuum, Ltd.Osaka Vacuum, Ltd., Japan |
Correspondent: | Click to Email |
A Monte-Carlo simulation of the transporting of sputtering particles was performed, using Born-Mayer potential as the two-body potential. Film thickness distribution on the substrate was calculated and compared to experimental results obtained under the same conditions. Calculations and experiments were made for a variety of gas pressures and target-substrate (T-S) distances.
The film thickness distribution on the substrate is determined by the distribution of particle emissions from the target, gas pressure and T-S distance. Therefore, if we can control the distribution of particle emissions, the pressure and the T-S distance, we can control the film thickness distribution on the substrate. The distribution of the transparent film thickness will create the designed Moire pattern.
Our simulations serve as basic research on this control.