AVS 62nd International Symposium & Exhibition | |
Thin Film | Wednesday Sessions |
Session TF+SS-WeM |
Session: | ALD Surface Reactions and Precursors |
Presenter: | Jyh-Wei Lee, Ming Chi University of Technology, Taiwan, Taiwan, Republic of China |
Authors: | J.W. Lee, Ming Chi University of Technology, Taiwan, Taiwan, Republic of China C.Y. Cheng, Ming Chi University of Technology, Taiwan, Taiwan, Republic of China P.W. Chang, Ming Chi University of Technology, Taiwan, Taiwan, Republic of China B.S. Lou, Chang Gung University, Taiwan, Taiwan, Republic of China |
Correspondent: | Click to Email |