AVS 62nd International Symposium & Exhibition
    Advanced Surface Engineering Tuesday Sessions
       Session SE+PS+SM-TuM

Paper SE+PS+SM-TuM3
Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

Tuesday, October 20, 2015, 8:40 am, Room 212A

Session: Atmospheric Pressure Plasmas, CVD and Other Deposition Methods
Presenter: Christian Mitterer, Montanuniversität Leoben, Austria
Authors: E. Jäger, Montanuniversität Leoben
J. Schmidt, INNOVENT e.V.
A. Pfuch, INNOVENT e.V.
S. Spange, INNOVENT e.V.
O. Beier, INNOVENT e.V.
O. Jantschner, Montanuniversität Leoben
R. Daniel, Montanuniversität Leoben
C. Mitterer, Montanuniversität Leoben, Austria
Correspondent: Click to Email
Zn- and Cu-doped SiOx films were applied by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. ZnOx and CuOx particles were found to be homogeneously embedded within the SiOx films. For both doping elements, bacteria are killed already within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition effect present only after the first day of exposure, due to the more pronounced release of zinc and copper. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications