AVS 62nd International Symposium & Exhibition
    Exhibitor Technology Spotlight Wednesday Sessions
       Session EW-WeM

Paper EW-WeM9
H2O2 Gas: Revolutionary new molecule for ALD

Wednesday, October 21, 2015, 10:40 am, Room Hall 1

Session: Exhibitor Technology Spotlight Session
Presenter: Jeffrey Spiegelman, RASIRC
Authors: J. Spiegelman, RASIRC
D. Alvarez, RASIRC
Correspondent: Click to Email
H2O2 is well known for its superior oxidizing capabilities. Now H2O2 is available in high concentration, with or without water and even without carrier gas. H2O2 gas is ideal for next generation materials and 3D architectures that are temperature and water sensitive. Learn about two innovative products that overcome Raoult’s Law and deliver stable, repeatable, high concentration H2O2 gas. The Peroxidizer delivers up to 5% H2O2 gas by volume from 30% H2O2 liquid solution. BRUTE Peroxide delivers anhydrous H2O2 gas for water sensitive processes such as ALD involving new materials and 3d architectures.