| AVS 62nd International Symposium & Exhibition | |
| Applied Surface Science | Monday Sessions |
| Session AS-MoM |
| Session: | Quantitative Surface Analysis: Obtaining Quantitative Information in the Face of Material Complexity and Morphology Influences |
| Presenter: | Amy Walker, University of Texas at Dallas |
| Authors: | W.F. Stickle, HP C.N. Young, HP M.D. Johnson, HP A.A. Ellsworth, University of Texas at Dallas A.V. Walker, University of Texas at Dallas |
| Correspondent: | Click to Email |
In the application of x-ray photoelectron spectroscopy the use of sputter depth profiling is one of the routinely used methods for analysis. Most industrial laboratories study a wide variety of material systems such as polymers or inorganic thin films and many of these material systems require analysis not just of the as received surface, but also of and through the depth of a thin film. Historically, mono atomic argon has been the ion source of choice in XPS, but even at low ion energies mono atomic argon will damage not only polymer systems converting them into amorphous carbon but also damage inorganic materials by creating, for example, intermediate oxides. In recent years other ion sources have become routinely available such as C60+ and most recently, gas cluster ion sources. From a practical standpoint, i t is important to understand the sputter induced chemistry that may be created by these various sources and the trade-offs for applying these different primary ion sources for routine surface chemical analyses. The effects of preferential sputtering and chemical changes or reactions of metal oxides will be discussed. Several different material systems are examined and discussed by comparing the information obtained using mono atomic argon, an argon gas cluster source and a C60+ ion gun for enhancing and clarifying ‘routine’ analyses. The different types of samples to be discussed will include niobium oxides, titanium nitride and multilayer thin films.