| AVS 61st International Symposium & Exhibition | |
| Thin Film | Tuesday Sessions |
| Session TF+PS-TuM |
| Session: | ALD for Emerging Applications |
| Presenter: | Jonas Gertsch, University of Colorado, Boulder |
| Authors: | J.C. Gertsch, University of Colorado, Boulder N.T. Eigenfeld, University of Colorado, Boulder J.M. Gray, University of Colorado, Boulder V.M. Bright, University of Colorado, Boulder S.M. George, University of Colorado, Boulder |
| Correspondent: | Click to Email |
Controlling the shape of nanostructures is crucial to the performance of nanodevices. Nanostructure shape can be tuned by varying stress in the various films that comprise the nanostructure. In this work, we explore the shape of Al2O3/W/Al2O3 trilayers fabricated using Al2O3 ALD and W ALD. Trilayer films were initially grown on polyimide molds that were formed into free standing “umbrella” nanostructures after processing and release. Depending on the stresses in the trilayer films and the thicknesses of the individual layers, the nanostructures can either remain flat or may curl up or down. The resulting shape can be controlled by varying the thicknesses of the individual Al2O3 ALD and W ALD layers in the trilayer. These “umbrella” nanostructures may be useful for microbolometer and other microelectromechanical systems (MEMS) applications. Additional studies will present stress measurements using atomic force microscope (AFM) investigations of ALD films in fixed-fixed and fixed-free cantilever structures.