AVS 61st International Symposium & Exhibition
    Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic Tuesday Sessions
       Session SA-TuA

Paper SA-TuA12
Reference-free, In-depth Characterization of Nanoscaled Materials by Combined X-ray Reflectivity and Grazing incidence X-ray Fluorescence Analysis

Tuesday, November 11, 2014, 6:00 pm, Room 312

Session: Free Electron Laser and Synchrotron Studies at the Molecule-Surface Interfaces
Presenter: Philipp Hönicke, Physikalisch-Technische Bundesanstalt, Germany
Authors: P. Hönicke, Physikalisch-Technische Bundesanstalt, Germany
M. Müller, Physikalisch-Technische Bundesanstalt, Germany
B. Detlefs, CEA-LETI, France
C. Fleischmann, IMEC, Belgium
B. Beckhoff, Physikalisch-Technische Bundesanstalt, Germany
Correspondent: Click to Email

The accurate in-depth characterization of nanoscaled layer systems is an essential topic for today’s developments in many fields of materials research. Thin high-κ layers [1], gate stacks and ultra-shallow dopant profiles are technologically relevant for current and future electronic devices. Nanolaminate composites, consisting of alternating layers of different materials with a nanometer scale thickness, are being developed for energy storage and memory applications [2]. However, the metrological challenges to sufficiently characterize such complex systems require a further development of the current analytical techniques.

Synchrotron-based Grazing Incidence X-ray Fluorescence (GIXRF) analysis has already been shown to be capable of contributing to the in-depth analysis of nanoscaled materials [3,4]. Essential for the quality of the results obtained with GIXRF is the calculation of the underlying X-ray standing wave field. This requires accurate knowledge of the optical properties of the system under investigation. Usually, this cannot be obtained from tabulated data due to the complexity of the sample in terms of layer thicknesses and material combinations and because of the fundamentally different material properties at the nanoscale.

The combination of GIXRF with X-Ray Reflectometry (XRR), provides access to the optical properties of the sample and has been shown to improve the characterization reliability of GIXRF [3]. Employing the novel in-house built instrumentation [5] and radiometrically calibrated detectors at the laboratory of the Physikalisch-Technische Bundesanstalt at the BESSY II synchrotron radiation facility, this combined method allows for reference-free quantitative in-depth analysis [3,4,6]. The capabilities of the combined XRR-GIXRF method are demonstrated by means of several nanoscaled layer systems as well as ultra-shallow dopant profiles.

[1] R.D. Clark, Materials 7(4), (2014), 2913.

[2] J. Azadmanjiri et al., J. Mater. Chem. A 2, (2014), 3695.

[3] P. Hönicke et al., J. Anal. At. Spectrom. 27, (2012), 1432.

[4] M. Müller et al., Materials 7(4), (2014), 3147.

[5] J. Lubeck et al., Rev. Sci. Instrum. 84, (2013), 045106.

[6] P. Hönicke, M. Müller, B. Beckhoff, Solid State Phenomena 195, (2013), 274.