AVS 61st International Symposium & Exhibition
    MEMS and NEMS Wednesday Sessions
       Session MN+PS-WeA

Paper MN+PS-WeA3
Microfabrication by Etching for Carbon Nanotube Composite Sheets

Wednesday, November 12, 2014, 3:00 pm, Room 301

Session: Emerging Materials and Fabrication Technologies for MEMS/NEMS
Presenter: Nathan Boyer, Brigham Young University
Authors: N. Boyer, Brigham Young University
J. Rowley, Brigham Young University
D.D. Allred, Brigham Young University
S. Liddiard, Moxtek, Inc
R.R. Vanfleet, Brigham Young University
R.C. Davis, Brigham Young University
Correspondent: Click to Email
We have prepared extremely smooth carbon nanotube (CNT)/polymer composite sheets and patterned them with holes and trenches using a process of photolithography and plasma etching. The high strength patterned CNT/polymer composite could be used in MEMS applications. A CNT sheet was impregnated with polyimide and the composite was cured in a vacuum hot press at 400°C. A film of amorphous silicon nitride was deposited on the composite sheet and patterned to act as a hard mask during oxygen plasma etching. Structural and mechanical testing of the CNT composite sheets will be presented along with plasma etching results.