AVS 61st International Symposium & Exhibition
    Magnetic Interfaces and Nanostructures Monday Sessions
       Session MI-MoA

Paper MI-MoA9
Identifying the Intrinsic Atomic Defects in Bi2Se3 with Scanning Tunneling Microscopy

Monday, November 10, 2014, 4:40 pm, Room 311

Session: Topological Insulators/Rashba Effect
Presenter: Jixia Dai, Rutgers University
Authors: J.-X. Dai, Rutgers University
D. West, Rensselaer Polytechnic Institute
X.-Y. Wang, Rutgers University
Y.-Z. Wang, Rutgers University
D. Kwok, Rutgers University
S.B. Zhang, Rensselaer Polytechnic Institute
S.-W. Cheong, Rutgers University
W. Wu, Rutgers University
Correspondent: Click to Email

In topological insulators the helical Dirac fermions are immune to backscattering as long as the time reversal symmetry is preserved. However, the existence of intrinsic atomic defects in materials such as Bi2Se3 and Bi2Te3 still represents one of the major issues for applications. Intrinsic atomic defects such as vacancies or antisites not only could dope charges, make the insulators conductive and shift the Dirac electrons away from the fermi energy but also affect the mobility of the materials by introducing disorder. By studying a series of Bi2Se3 samples that were grown with different conditions with atomic resolving scanning tunneling microscopy, we have successfully identified several types of intrinsic defects, including Se vacancies and Bi-Se antisites. The densities of these different types of defects could be correlated with growth conditions and the total density is related to the band shift measured by tunneling spectroscopy. Our study demonstrates the capability of scanning tunneling microscopy in diagnosing materials like Bi2Se3 and similar ones at the atomic level.