AVS 61st International Symposium & Exhibition
    Electronic Materials and Processing Monday Sessions
       Session EM+MI+NS-MoM

Invited Paper EM+MI+NS-MoM5
Controlling Complex Oxide Chemistry to Enable Advanced Dielectric, Ferroelectric, and Electronic Applications

Monday, November 10, 2014, 9:40 am, Room 314

Session: Complex Oxides and Their Interfaces
Presenter: Lane Martin, University of California, Berkeley
Correspondent: Click to Email

Current and next-generation advanced functional materials are testing our ability to produce high-quality, complex materials with ever increasing precision. Particular interest has been given to candidate complex oxide materials which present a diverse range of material properties and functionality not easily produced in other classes of materials. The ultimate integration and utilization of these materials, however, will require that we can carefully and deterministically balance the intrinsic phenomena of interest in these materials with a knowledge of the potential extrinsic effects that can arise form defects which result from our inability to produce these complex materials with the precision we desire. This is made more challenging by the fact that these complex oxide systems are prone to and can accommodate large densities of point defects through a range of internal compensation mechanisms. In this presentation, we will explore the interrelationship between the complex oxide growth process, the chemical nature of these complex materials, the resulting structure and strain evolution, and the ultimate effect on properties in a range of prototypical complex oxide materials. We will explore these interrelationships in model systems including the classic dielectric materials SrTiO3 and LaAlO3, highly-controlled heterointerfaces that exhibit exotic physics including the LaAlO3/SrTiO3 system, and ferroic systems such as BaTiO3 and others. In this context, we will demonstrate routes by which we can deterministically utilize the tendency for these materials to form point defects to enhance epitaxial thin film strain, developing new modalities of strain control of thin-film materials that go beyond traditional lattice mismatch effects, and how the combination of epitaxial strain and defects in materials can be used to enhance performance, independently tune susceptibilities, and provide new insights into the nature of these complex materials. For instance, in BaTiO3 we will illustrate how one can couple epitaxial strain to defect structures to provide an additional out-of-plane strain component that can dramatically enhance ordering temperatures and will explore the use of compositionally-graded heterostructures to further extend what can be done with epitaxial strain to manipulate dielectric, ferroelectric, and electronic properties of materials.