AVS 61st International Symposium & Exhibition
    2D Materials Focus Topic Thursday Sessions
       Session 2D+AS+HI+NS+SS-ThM

Paper 2D+AS+HI+NS+SS-ThM13
Graphene Silicon Interfaces at the Two-Dimensional Limit

Thursday, November 13, 2014, 12:00 pm, Room 310

Session: Nanostructures including 2D Heterostructures, Patterning of 2D Materials 
Presenter: Brian Kiraly, Northwestern University
Authors: B.T. Kiraly, Northwestern University
A.J. Mannix, Northwestern University
M.C. Hersam, Northwestern University
N.P. Guisinger, Argonne National Laboratory
Correspondent: Click to Email

Artificial van der Waals heterostructures have demonstrated both significant improvements of graphene's intrinsic properties and entirely new properties of their own. Early interest in these structures was based on nearly ideal carrier mobility in graphene on two-dimensional (2D) hexagonal boron nitride. Although exfoliation and reassembly of bulk vdW solids has yielded impressive initial results, this method inherently limits the geometry and constituent materials of these structures. Growth of 2D heterostructures has been demonstrated, but mainly limited to the prototypical graphene/hBN system. Adding new constituent materials, particularly those with electronic heterogeneity, to these 2D heterostructures allows them to be engineered with a variety of new properties.

We present the growth and characterization of interfaces between an atomically thin silicon layer and graphene. First, graphene is grown on Ag(111) via atomic carbon deposition at temperatures from 600°C -700°C. Following the growth of graphene, atomic silicon is evaporated on the graphene-covered Ag(111) substrate at 320°C-360°C. The resulting silicon growth results in facetted domains capped with a honeycomb lattice with periodicity 6.4 Å; Raman spectroscopy reveals peaks at 520 cm-1 and 900-1000 cm-1 thatcoincide precisely with bulk diamond cubic silicon, indicating these domains are comprised of sp3 bonded crystalline Si. These 2D sheets of silicon demonstrate both semiconducting character and a honeycomb lattice is attributed to a silver-based reconstruction of the Si(111) surface. The resulting silicon domains grow in two different configurations with respect to the dendritic graphene: (1) silicon domains appear to grow directly on the Ag(111) surface and terminate at the graphene boundaries. These in-plane interfaces are atomically-precise and clearly resolved via scanning tunneling microscopy. Electronically, the density of states of both isolated constituent materials persist to these interfaces within the resolution of the measurement, indicating little interaction at the border. (2) The silicon growth is observed underneath the existing graphene flakes. The vertically stacked silicon graphene domains are identified via atomically resolved imaging through the graphene domains at larger biases where graphene is transparent under STM. Furthermore, the vertical materials interfaces demonstrate distinct electronic signatures from either constituent material. The resulting interfaces represent atomically pristine interfaces between graphene and a sp3 bonded semiconducting Si film, demonstrating a significant step forward in the diversification of van der Waals heterostructures.