AVS 61st International Symposium & Exhibition
    2D Materials Focus Topic Tuesday Sessions
       Session 2D+AS+HI+MC+NS+PS+SP+SS-TuA

Paper 2D+AS+HI+MC+NS+PS+SP+SS-TuA10
Influence of Chemisorbed Oxygen on the Growth of Graphene on Cu(100) and Cu(111) by Chemical Vapor Deposition

Tuesday, November 11, 2014, 5:20 pm, Room 310

Session: 2D Materials Characterization including Microscopy and Spectroscopy 
Presenter: EngWen Ong, University at Albany-SUNY
Authors: E.W. Ong, University at Albany-SUNY
Z.R. Robinson, U.S. Naval Research Laboratory
T.R. Mowll, University at Albany-SUNY
P. Tyagi, University at Albany-SUNY
H. Geisler, SUNY College at Oneonta
C.A. Ventrice, Jr., University at Albany-SUNY
Correspondent: Click to Email

The influence of chemisorbed oxygen on the growth of graphene by catalytic decomposition of ethylene in an ultra-high vacuum (UHV) chamber on both the Cu(100) and Cu(111) surfaces has been studied. A custom UHV compatible heater stage was constructed that allows heating of a crystal to temperatures as high as 1000 °C at hydrocarbon pressures of up to 100 mTorr. System recovery to the low 10-10 Torr range is achieved within a few minutes of opening the gate valve to the turbo pump. The crystal structure of the graphene films was characterized with in-situ low energy electron diffraction (LEED), and the growth morphology was monitored by ex-situ scanning electron microscopy (SEM). For the clean Cu(100) substrate, heating from room temperature to the growth temperature while dosing with ethylene resulted in the formation of epitaxial graphene films. The crystal quality was found to depend strongly on the growth temperature. At 900 °C, well-ordered two-domain graphene films were formed. For the Cu(111) surface, heating from room temperature to the growth temperature while dosing with ethylene did not result in the formation of graphene. This is attributed to the lower catalytic activity of the (111) surface and the relatively high vapor pressure of the Cu surface. The use of an Ar overpressure to suppress Cu sublimation during the growth resulted in the formation of predominately single-domain epitaxial graphene films. Predosing either the Cu(100) or Cu(111) surface with a chemisorbed layer of oxygen before graphene growth was found to adversely affect the crystal quality of the graphene overlayers by inducing a much higher degree of rotational disorder of the graphene grains with respect to the substrate. The SEM analysis revealed that the nucleation rate of the graphene islands dropped by an order of magnitude after predosing either the Cu(100) or Cu(111) surface with a chemisorbed oxygen layer before growth. On the other hand, the average area of each graphene island was observed to increase by at least an order of magnitude. Therefore, the presence of oxygen during graphene growth affects both the relative orientation and average size of grains within the films grown on both substrates.