AVS 60th International Symposium and Exhibition | |
Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | TF-TuM1 Fabrication of Top Gate Graphene Transistor using Physically Transferrable High-k Nanosheet using Atomic Layer Deposition H. Jung, J. Lee, K. Ko, J. Park, H. Kim, Yonsei University, Republic of Korea |
8:20am | TF-TuM2 Resistive Switching Devices Based on Ozone assisted ZnO Films by Atomic Layer Deposition R.M. Mundle, A.K. Pradhan, Norfolk State University |
8:40am | TF-TuM3 Invited Paper Process Design and Development of ALD for Co(W) Alloy Films as Single Layered Barrier and Liner Material in Future Cu ULSI Interconnects Y. Shimogaki, The University of Tokyo, Japan |
9:20am | TF-TuM5 Control of Oxygen Vacancies by Plasma Enhanced Atomic Layer Deposition (PEALD) of TiO2 for Memristors S.-J. Park, J.-P. Lee, J.S. Jang, H. Rhu, H. Yu, B.Y. You, C.S. Kim, K.J. Kim, Y.-J. Cho, Korea Research Institute of Standards and Science (KRISS), Republic of Korea, S. Baik, POSTECH, Republic of Korea, W. Lee, Korea Research Institute of Standards and Science (KRISS), Republic of Korea |
9:40am | TF-TuM6 Area Selective Atomic Layer Deposition of Dielectric Films on Metal/Dielectric Patterns F. Minaye Hashemi, S.F. Bent, Stanford University |
10:40am | TF-TuM9 Development of an Open-Ended Rotary Reactor for Plasma-Assisted ALD on Particles J. Clancey, J. Yin, L. Baker, A.S. Cavanagh, S.M. George, University of Colorado, Boulder |
11:00am | TF-TuM10 Metal Ion Photoreduction on ALD Thin Films J.C. Halbur, A. Madan, J.S. Jur, North Carolina State University |
11:20am | TF-TuM11 Highly Conductive and Flexible Nylon-6 Nonwoven Fiber Mats Formed using Tungsten Atomic Layer Deposition B. Kalanyan, C.J. Oldham, W.J. Sweet III, G.N. Parsons, North Carolina State University |
11:40am | TF-TuM12 Room-Temperature Atomic Layer Deposition of Platinum A.J.M. Mackus, D. Garcia-Alonso, H.C.M. Knoops, A.A. Bol, W.M.M. Kessels, Eindhoven University of Technology, Netherlands |