AVS 60th International Symposium and Exhibition
    Thin Film Tuesday Sessions

Session TF-TuM
ALD for Emerging Applications

Tuesday, October 29, 2013, 8:00 am, Room 104 A
Moderator: G.S. Scarel, James Madison University


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF-TuM1
Fabrication of Top Gate Graphene Transistor using Physically Transferrable High-k Nanosheet using Atomic Layer Deposition
H. Jung, J. Lee, K. Ko, J. Park, H. Kim, Yonsei University, Republic of Korea
8:20am TF-TuM2
Resistive Switching Devices Based on Ozone assisted ZnO Films by Atomic Layer Deposition
R.M. Mundle, A.K. Pradhan, Norfolk State University
8:40am TF-TuM3 Invited Paper
Process Design and Development of ALD for Co(W) Alloy Films as Single Layered Barrier and Liner Material in Future Cu ULSI Interconnects
Y. Shimogaki, The University of Tokyo, Japan
9:20am TF-TuM5
Control of Oxygen Vacancies by Plasma Enhanced Atomic Layer Deposition (PEALD) of TiO2 for Memristors
S.-J. Park, J.-P. Lee, J.S. Jang, H. Rhu, H. Yu, B.Y. You, C.S. Kim, K.J. Kim, Y.-J. Cho, Korea Research Institute of Standards and Science (KRISS), Republic of Korea, S. Baik, POSTECH, Republic of Korea, W. Lee, Korea Research Institute of Standards and Science (KRISS), Republic of Korea
9:40am TF-TuM6
Area Selective Atomic Layer Deposition of Dielectric Films on Metal/Dielectric Patterns
F. Minaye Hashemi, S.F. Bent, Stanford University
10:40am TF-TuM9
Development of an Open-Ended Rotary Reactor for Plasma-Assisted ALD on Particles
J. Clancey, J. Yin, L. Baker, A.S. Cavanagh, S.M. George, University of Colorado, Boulder
11:00am TF-TuM10
Metal Ion Photoreduction on ALD Thin Films
J.C. Halbur, A. Madan, J.S. Jur, North Carolina State University
11:20am TF-TuM11
Highly Conductive and Flexible Nylon-6 Nonwoven Fiber Mats Formed using Tungsten Atomic Layer Deposition
B. Kalanyan, C.J. Oldham, W.J. Sweet III, G.N. Parsons, North Carolina State University
11:40am TF-TuM12
Room-Temperature Atomic Layer Deposition of Platinum
A.J.M. Mackus, D. Garcia-Alonso, H.C.M. Knoops, A.A. Bol, W.M.M. Kessels, Eindhoven University of Technology, Netherlands