| AVS 60th International Symposium and Exhibition | |
| Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-TuA1 Invited Paper A Comparison between Conventional- and Spatial ALD; The Effect of Pressure and Exposure Time on Film Properties P. Poodt, Holst Centre / TNO, Netherlands |
| 2:40pm | TF-TuA3 Invited Paper Thin-film Electronics by Spatial ALD S.F. Nelson, C.R. Ellinger, L.W. Tutt, Eastman Kodak Company |
| 4:00pm | TF-TuA7 Invited Paper Roll to Roll PEALD of Mixed Oxide Films for High Barrier Applications E.R. Dickey, Lotus Applied Technology |
| 4:40pm | TF-TuA9 Spatial Atomic Layer Deposition for New Generation Solar Cells D. Muñoz-Rojas, G. Ercolano, A.T. Marin, C.T. Armstrong, R.L.Z. Hoye, K.P. Musselman, J.L. MacManus-Driscoll, University of Cambridge, UK |
| 5:00pm | TF-TuA10 Spatial Molecular Layer Deposition of Metalcones M. Smets, F. van den Bruele, P. Poodt, Holst Centre / TNO, Netherlands |