| AVS 60th International Symposium and Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+PS-ThM1 Non-destructive Spectroscopic Analysis of Gradient Hydrocarbon/Fluorocarbon Thin Films to Demonstrate the Formation of a Stable Gradient Structure during PECVD Film Growth B.D. Tompkins, E.R. Fisher, Colorado State University |
| 8:20am | TF+PS-ThM2 CVD Infiltration of Carbon into Carbon Nanotube Forests for Templated Microfabrication R.R. Vanfleet, W. Fazio, J.M. Lund, K. Zufelt, T. Wood, D.D. Allred, R.C. Davis, B.D. Jensen, Brigham Young University |
| 8:40am | TF+PS-ThM3 Invited Paper Initiated Chemical Vapor Deposition of Functional Polymers onto Porous Materials and Liquid Surfaces M. Gupta, University of Southern California |
| 9:20am | TF+PS-ThM5 Ultrasonic Spray Deposition of Mesoporous WO3 Films Displaying 100% Optical Modulation C.-P. Li, Colorado School of Mines, C. Engtrakul, R.C. Tenent, National Renewable Energy Laboratory, C.A. Wolden, Colorado School of Mines |
| 9:40am | TF+PS-ThM6 Preparation and Characterization of CVD & ALD Tungsten & Molybdenum Thin Films for CNT-M Metallic Microstructures D.D. Allred, R.R. Vanfleet, J.K. Anderson, C. Brown, R.S. Hansen, Brigham Young University, D. McKenna, University of Notre Dame, R.C. Davis, Brigham Young University |
| 10:40am | TF+PS-ThM9 Silica Structures by Plasma-enhanced Chemical Vapor Infiltration of a Carbon Nanotube Template J.M. Lund, B.D. Jensen, R.C. Davis, R.R. Vanfleet, Brigham Young University |
| 11:00am | TF+PS-ThM10 High Deposition Rate and Uniformity of Silicon Thin Films Deposited Via Efficient, Low-Damage Surface Wave Plasma Source J. Peck, P.S. Zonooz, D. Curreli, University of Illinois at Urbana Champaign, M. Reilly, R. Stubbers, B. Jurczyk, Starfire Industries, LLC, D.N. Ruzic, University of Illinois at Urbana Champaign |
| 11:20am | TF+PS-ThM11 Ab-initio and Classical Molecular Dynamics Study of Diffusion of Ti and N Adatoms on the TiN(001) Surface D.G. Sangiovanni, D. Edström, L. Hultman, Linköping University, Sweden, I.G. Petrov, J.E. Greene, University of Illinois at Urbana Champaign, V. Chirita, Linköping University, Sweden |
| 11:40am | TF+PS-ThM12 Quantum Chemistry Analysis of the Role of Radicals in Plasma Assisted Atomic Layer Deposition of Silicon Nitride Films J. Yoshikawa, N. Fukiage, S.Y. Kang, Tokyo Electron Ltd., P. Ventzek, Tokyo Electron America, H. Ueda, Tokyo Electron Ltd. |