AVS 60th International Symposium and Exhibition
    Thin Film Monday Sessions

Session TF+EN-MoM
ALD for Energy

Monday, October 28, 2013, 8:20 am, Room 104 A
Moderator: W.M.M. Kessels, Eindhoven University of Technology, Netherlands


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am TF+EN-MoM1 Invited Paper
Thin Film Electrolyte via Atomic Layer Deposition for Low Temperature Solid Oxide Fuel Cells
G. Cho, S. Cha, J. Paek, J. Park, I. Change, Seoul National University, Republic of Korea
9:00am TF+EN-MoM3
Coaxial ALD Nanotube Structures for Functional Nanopore Battery
C. Liu, X. Chen, M. Schroeder, K. Gregorczyk, University of Maryland, College Park, S.B. Lee, University of Maryland, College Park and Korea Advanced Institute of Science and Technology, G.W. Rubloff, University of Maryland, College Park
9:20am TF+EN-MoM4
Engineering Lithium-Containing Ionic Conductive Thin Films by Atomic Layer Deposition for Lithium-ion Battery Applications
J. Cho, Y. Perng, D. Membreno, N. Cirigliano, B. Dunn, J.P. Chang, UCLA
9:40am TF+EN-MoM5
Manganese Oxide Pseudocapacitive Supercapacitors from Electrochemical Oxidation of MnO ALD Films
M.J. Young, C.B. Musgrave, S.M. George, University of Colorado, Boulder
10:00am TF+EN-MoM6
Low Temperature Atomic Layer Deposition Processes for Flexible Dye-Sensitized Solar Cells
M. Creatore, D. Garcia-Alonso, A.J.M. Mackus, Eindhoven University of Technology, Netherlands, V. Zardetto, T.M. Brown, University of Rome "Tor Vergata", Italy, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
11:00am TF+EN-MoM9
Performance of ALD Oxide Films in Polarized Infrared Power Generation
G.S. Scarel, Y. Schwab, H.S. Mann, B.N. Lang, James Madison University, J.L. Lancaster, University of North Carolina at Greensboro, R.J. Parise, Parise Research Technologies
11:20am TF+EN-MoM10
Synthesis of Pd and Pt Nanoparticles by Atomic Layer Deposition for Catalysis Applications
M. Weber, M.A. Verheijen, A.A. Bol, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
11:40am TF+EN-MoM11
In Situ Characterization of Plasma-Assisted Pt ALD on W ALD Adhesion Layers with Spectroscopic Ellipsometry
A.S. Cavanagh, L. Baker, J. Clancey, J. Yin, University of Colorado at Boulder, A. Kongkanand, F.T. Wagner, General Motors Research and Development, S.M. George, University of Colorado at Boulder