AVS 60th International Symposium and Exhibition | |
Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | PS1-TuM1 Non-ambipolar Electron Plasma and its Physical Properties L. Chen, Z.Y. Chen, M. Funk, Tokyo Electron America, Inc. |
8:20am | PS1-TuM2 Ion Energy-Angular Distributions in Dual Frequency Capacitively Coupled Plasmas Using Phase Control Y. Zhang, M.J. Kushner, University of Michigan |
8:40am | PS1-TuM3 Investigation of Photo-Assisted Etching in Different Halogen-Containing Plasmas and Synergetic Effects of a Tandem Plasma System W. Zhu, L. Liu, S. Sridhar, V.M. Donnelly, D.J. Economou, University of Houston |
9:00am | PS1-TuM4 Control of Energy Distributions in Inductively Coupled Plasmas using Tandem Power Sources M.D. Logue, University of Michigan, W. Zhu, H. Shin, L. Liu, S. Sridhar, V.M. Donnelly, D.J. Economou, University of Houston, M.J. Kushner, University of Michigan |
9:20am | PS1-TuM5 Si-Gate Etching in Radial Line Slot Antenna Plasmas: Control of Selectivity, Anisotropy and Loading S. Voronin, A. Ranjan, H. Kintaka, K. Kumar, P. Biolsi, TEL Technology Center, America, LLC |
9:40am | PS1-TuM6 Vacuum-Ultraviolet Emission Spectra of Plasma-Processing Reactors K. Mavrakakis, M. Nichols, W. Li, K. Katz, University of Wisconsin-Madison, J. McVittie, A. Hazeghi, Stanford University, S. Banna, Applied Materials Inc., Y. Nishi, Stanford University, J.L. Shohet, University of Wisconsin-Madison |
10:40am | PS1-TuM9 Invited Paper Counteractions to Plasma Chamber Corrosions by Earthquake T. Moriya, Tokyo Electron, Japan |
11:20am | PS1-TuM11 An Improved Cathodic Arc Plasma Source for Large Area Coatings J. Kolbeck, A. Anders, Lawrence Berkeley National Laboratory |
11:40am | PS1-TuM12 High Density Narrow Tube Ozonizer by Increased Barrier Discharge Frequency J. Tsujino, T. Kitajima, T. Nakano, National Defense Academy of Japan |